1. Metrology - Laboratory
  2. Laboratory Equipment
  3. Water cooler
  4. Wuxi Guanya Temperature Refrigeration Technology Co. Ltd..
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Water chiller SUNDI
laboratorymobilehigh-speed

Water chiller - SUNDI - Wuxi Guanya Temperature Refrigeration Technology Co. Ltd.. - laboratory / mobile / high-speed
Water chiller - SUNDI - Wuxi Guanya Temperature Refrigeration Technology Co. Ltd.. - laboratory / mobile / high-speed
Water chiller - SUNDI - Wuxi Guanya Temperature Refrigeration Technology Co. Ltd.. - laboratory / mobile / high-speed - image - 2
Water chiller - SUNDI - Wuxi Guanya Temperature Refrigeration Technology Co. Ltd.. - laboratory / mobile / high-speed - image - 3
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Characteristics

Material
water
Applications
laboratory
Other characteristics
mobile, high-speed
Power

10 kW, 14 kW, 18 kW, 26 kW, 40 kW

Maximum temperature

Min.: -60 °C
(-76 °F)

Max.: 300 °C
(572 °F)

Flow rate

50 l/min, 75 l/min, 110 l/min, 150 l/min
(13.209 us gal/min, 19.813 us gal/min, 29.059 us gal/min, 39.626 us gal/min)

Pressure

2 bar, 2.5 bar
(29.008 psi, 36.259 psi)

Description

A fully closed piping design, high efficiency plate heat exchanger used to reduce the demand for the thermal fluid utilization while providing the system to achieve the rapid ups and downs in temperature The whole system is a closed liquid circulation system with the expansion of container, expansion of the container and the liquid circulation is adiabatic, and do not participate in liquid circulation, only mechanical connection, regardless of the temperature is a high temperature or low temperature, the tank temperature is limited to 60℃. Therefore, during the process the risk of imbibing and volatilization of the heat conducting medium is reduced. There following advantages for the user. Typical application of refrigeration heating temperature control system Dynamic thermostatic control of cold and heat source of high pressure reaction kettle, dynamic thermostatic control of double layer glass reaction kettle, and dynamic thermostatic control of cold and hot source of double-layer reactor. Microchannel reactor thermostatic control, small temperature control system, steam - feeding system temperature control, material low temperature aging test. The thermostatic control of the combined chemical cold source heat source, the cooling heating of the semiconductor equipment and the heating temperature of the vacuum chamber are controlled.
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.