GISAXS diffractometer Xeuss 3.0

SAXSUSAXSWAXS

The Next Generation beamline for the laboratory Maximum flexibility Ultimate performance Plenty of space for sample environment The Xeuss 3.0 is the latest generation instrument in the proven Xeuss family and is already installed in leading research facilities around the world. It incorporates all the latest innovations from Xenocs for added capabilities, flexibility and ease-of-use. Characterize the nanostructure of soft-matter and nanomaterials using SAXS/WAXS and USAXS technique in transmission or grazing incidence mode. – Particle size distribution ranging from few nanometers to more than 350 nm in diameter – Crystallization rates and lamellar structure of semicrystalline polymers – Size and shape analysis of surfactants or proteins in solutions – Organization and orientation of nanomaterials at atomic or nanoscale, in bulk phases or at surfaces – Phase segregation studies of alloys – In situ studies of nanostructure transitions Maximum flexibility Provide structural tools to a large community of users with full remote operation capability and access to a unique range of length-scales. Advanced nanomaterials development and design require characterization over a large range of length scales. The Xeuss 3.0 offers such measuring capability over up to 5 orders in magnitude in q (wave vector) through entirely motorized change of configurations. Any trained user can thus operate the system remotely over its complete measurement range for a given sample or batch of samples. Automatic change of measuring settings include: Q-Xoom change of measurement resolution through motorized translation of detector Sequential SAXS /USAXS measurement with Bonse-Hart USAXS module